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Profiling border-traps by TCAD analysis of multifrequency CV-curves in Al2O3/InGaAs stacks | IEEE Conference Publication | IEEE Xplore

Profiling border-traps by TCAD analysis of multifrequency CV-curves in Al2O3/InGaAs stacks


Abstract:

This paper reports physics based TCAD simulations of multi-frequency C-V curves of In0.53Ga0.47As MOSCAPs including the AC response of the border traps. The calculations ...Show More

Abstract:

This paper reports physics based TCAD simulations of multi-frequency C-V curves of In0.53Ga0.47As MOSCAPs including the AC response of the border traps. The calculations reproduce the experimental inversion and accumulation capacitance versus frequency, and provide a means to profile the space and energy density of states of border traps. A sensitivity analysis of the results to border traps' distribution is carried out changing the trap volume and the oxide capacitance.
Date of Conference: 19-21 March 2018
Date Added to IEEE Xplore: 07 May 2018
ISBN Information:
Electronic ISSN: 2472-9132
Conference Location: Granada, Spain

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