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Lithography at a wavelength of 193 nm | IBM Journals & Magazine | IEEE Xplore

Lithography at a wavelength of 193 nm


Abstract:

The trend in microelectronics toward printing features 0.25 µm and below has motivated the development of lithography at the 193-nm wavelength of argon fluoride excimer l...Show More

Abstract:

The trend in microelectronics toward printing features 0.25 µm and below has motivated the development of lithography at the 193-nm wavelength of argon fluoride excimer lasers. This technology is in its early stages, but a picture is emerging of its strengths and limitations. The change in wavelength from 248 to 193 nm requires parallel progress in projection systems, optical materials, and photoresist chemistries and processes. This paper reviews the current status of these various topics, as they have been engineered under a multiyear program at MIT Lincoln Laboratory.
Published in: IBM Journal of Research and Development ( Volume: 41, Issue: 1.2, January 1997)
Page(s): 49 - 55
Date of Publication: January 1997

ISSN Information: