Effect of uniform stress on Si p-n junctions | IEEE Journals & Magazine | IEEE Xplore

Effect of uniform stress on Si p-n junctions


Abstract:

A new method is described for produchrg large stress levels in semiconductor devices. The relative change in breakdown voltage induced by uniaxial stress σ was found to b...Show More

Abstract:

A new method is described for produchrg large stress levels in semiconductor devices. The relative change in breakdown voltage induced by uniaxial stress σ was found to be (ΔV/VB)/σ≃-0.48 × 10-12, where stress is given in dynes/cm2. Experimental results are compared with the energy band model for the piezojunction effect.
Published in: Proceedings of the IEEE ( Volume: 56, Issue: 7, July 1968)
Page(s): 1221 - 1222
Date of Publication: 31 July 1968

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