I. Introduction
Considering the complex fabrication of small transistors with junctions and Short Channel Effects (SCEs) related to the drain control over the channel charges with the transistor reduction, the Junctionless Nanowire Transistor raised as a solution to minimize the drain and source effect over the channel with the reduction of the transistor dimensions [1]. Since the device presents a constant doping profile along all the silicon active layer, the device seems to have a better electrical characteristic with respect to the MOSFET with junctions, reflecting on a better subthreshold slope and a low drain induced barrier lowering (DIBL) [2].