Visible Light Sensitivity Enhancement of CMOS Image Sensor with Pseudo High Refractive Index Film Integrated by Directed Self-Assembly Process

We have developed a back-illuminated CMOS image sensor (BI -CIS) using a pseudo high refractive index film (pHRF) consisting of an array of minute holes. The new process architecture for the low reflectivity surface is achieved by integrating the directed self-assembly (DSA) process with the conventional process. This is the first report of an image sensor fabricated using the DSA process. The proposed sensor has low dark current and has enhanced sensitivity for wavelengths ranging from 400 nm to 550 nm.