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300mm+ factory layout design and innovations for advanced semiconductor manufacturing | IEEE Conference Publication | IEEE Xplore

300mm+ factory layout design and innovations for advanced semiconductor manufacturing


Abstract:

In conclusion, the study has applied AHP method to compare and to define the weighting of factors in a factory macro layout design. The results pointed out process flow, ...Show More

Abstract:

In conclusion, the study has applied AHP method to compare and to define the weighting of factors in a factory macro layout design. The results pointed out process flow, process time, contamination control rule and safety rule are the critical factors. Thus, from macro layout design stage, layout design team needs to consider process flow and process time by different technology nodes because those have great impact on manufacturing performance [3]. In addition to operation related issue, factory layout design also needs to focus on safety & risk related issue such as defining escape path, tool move-in path or other ergonomics issues.
Date of Conference: 19-21 May 2014
Date Added to IEEE Xplore: 08 July 2014
Electronic ISBN:978-1-4799-3944-2

ISSN Information:

Conference Location: Saratoga Springs, NY, USA

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