I. Introduction
Silicon (si) is the most attractive material for solar cell applications because it exhibits many advantages of well-known technology components: abundance in the earth, low cost, nontoxicity, and long-term stability. However, one disadvantage of Si is the weak absorption at long wavelengths, due to the indirect bandgap. Therefore, manufacturing of conventional silicon solar cells employs a potassium hydroxide (KOH) solution to etch the silicon surface, forming a pyramid structure to increase light trapping as a result of longer absorbing path length [1], [2]. Recently, surface plasmon resonances (SPRs) using metallic nanoparticles (NPs) have been developed to amplify the incident light source, and have been widely applied to solar cells [3]–[7]. The mechanism of SPR is that the incident light on the metallic NPs can excite localized plasma resonances in the particle layer, inducing dipole oscillations in the individual particles, which will enhance the incident electromagnetic field, and then couple radiatively to the semiconductor layer, increasing the optical absorption of incident photons within the solar cell and hence increasing the short-circuit current of the solar cells [8]–[11].