Abstract:
Device scaling with manufacturing methods that overcome the inherent limits of optical lithography is a constant focus of the microelectronics industry. The authors of th...Show MoreMetadata
Abstract:
Device scaling with manufacturing methods that overcome the inherent limits of optical lithography is a constant focus of the microelectronics industry. The authors of this tutorial article review the state-of-the-art and major challenges of subresolution lithography, and discuss modern double-patterning lithography solutions and supporting EDA tools to surpass them.
Published in: IEEE Design & Test ( Volume: 30, Issue: 3, June 2013)
Keywords assist with retrieval of results and provide a means to discovering other relevant content. Learn more.
- IEEE Keywords
- Index Terms
- Limited Resolution ,
- Complex Design ,
- Photolithography ,
- Second Harmonic Generation ,
- Design Flow ,
- Technology Node ,
- Extreme Ultraviolet ,
- Resolution Of Patterns ,
- Electronic Design Automation ,
- Ultraviolet Lithography ,
- Optical System ,
- Preferred Orientation ,
- Increase In Complexity ,
- Color Space ,
- Pattern Matching ,
- Vertical Component ,
- Neighborhood Characteristics ,
- Diffraction Grating ,
- Design Constraints ,
- Minimum Spacing ,
- Conservative Rule ,
- Complementary Colors ,
- Horizontal Boundary ,
- Design Manufacturing ,
- Color Assignment ,
- Resolution Enhancement ,
- Sweet Spot ,
- Processing Window ,
- Optical Correction ,
- Point Of Introduction
Contents Keywords assist with retrieval of results and provide a means to discovering other relevant content. Learn more.
- IEEE Keywords
- Index Terms
- Limited Resolution ,
- Complex Design ,
- Photolithography ,
- Second Harmonic Generation ,
- Design Flow ,
- Technology Node ,
- Extreme Ultraviolet ,
- Resolution Of Patterns ,
- Electronic Design Automation ,
- Ultraviolet Lithography ,
- Optical System ,
- Preferred Orientation ,
- Increase In Complexity ,
- Color Space ,
- Pattern Matching ,
- Vertical Component ,
- Neighborhood Characteristics ,
- Diffraction Grating ,
- Design Constraints ,
- Minimum Spacing ,
- Conservative Rule ,
- Complementary Colors ,
- Horizontal Boundary ,
- Design Manufacturing ,
- Color Assignment ,
- Resolution Enhancement ,
- Sweet Spot ,
- Processing Window ,
- Optical Correction ,
- Point Of Introduction
