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Surface potential model of a high-k HfO2-Ta2O5 capacitor | IEEE Conference Publication | IEEE Xplore

Surface potential model of a high-k HfO2-Ta2O5 capacitor


Abstract:

A compact model of a MOS capacitor with high-k HfO2-Ta2O5 mixed layer stack is developed in Matlab. Model equations are based on the surface potential description of PSP ...Show More

Abstract:

A compact model of a MOS capacitor with high-k HfO2-Ta2O5 mixed layer stack is developed in Matlab. Model equations are based on the surface potential description of PSP model. After fitting the C-V characteristics in Matlab the model is coded in Verilog-A hardware description language to interface with Spectre circuit simulator within Cadence CAD system. The results are validated against experimental measurements of high-k dielectric structure.
Date of Conference: 24-26 May 2012
Date Added to IEEE Xplore: 28 June 2012
ISBN Information:
Conference Location: Warsaw, Poland

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