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A millimeter-wave capable SiGe BiCMOS process with 270GHz FMAX HBTs designed for high volume manufacturing | IEEE Conference Publication | IEEE Xplore

A millimeter-wave capable SiGe BiCMOS process with 270GHz FMAX HBTs designed for high volume manufacturing


Abstract:

A new SiGe BiCMOS process, SBC18H3 is described which features SiGe HBTs with 240GHz FT and 270 GHz FMAX. The HBT devices are described in detail along with several other...Show More

Abstract:

A new SiGe BiCMOS process, SBC18H3 is described which features SiGe HBTs with 240GHz FT and 270 GHz FMAX. The HBT devices are described in detail along with several other mm-wave components included in the process. The process is based on a high-volume manufacturing-proven 0.18um SiGe BiCMOS base platform which has been running at TowerJazz for almost a decade and has been used to produce over 100,000 8" wafers. Additional mm-wave enablement devices offered in the process include MOS varactors, P-I-N diodes and sub-10fF MIM capacitors. Additional key metrics for the SiGe HBT device include an NFMIN of 2dB at 40GHz, a BVCEO of 1.6V and a DC current gain of 1200.
Date of Conference: 09-11 October 2011
Date Added to IEEE Xplore: 17 November 2011
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Conference Location: Atlanta, GA, USA

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