Investigation on the field leakage current in 0.35μm CMOS technology at high temperature | IEEE Conference Publication | IEEE Xplore

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Investigation on the field leakage current in 0.35μm CMOS technology at high temperature


Abstract:

For the first time, this paper demonstrates the experimental results for two types of test structures of field transistors up to 200°C. The field transistor structures wh...Show More

Abstract:

For the first time, this paper demonstrates the experimental results for two types of test structures of field transistors up to 200°C. The field transistor structures which are stripe (conventional) and square ring (new) structures were measured and investigated in term of field leakage current and on-state characterization at high temperature.
Date of Conference: 22-25 March 2010
Date Added to IEEE Xplore: 20 May 2010
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Conference Location: Hiroshima, Japan

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