Calculation of the Depletion Region Width and Barrier Capacitance of Diffused Semiconductor Junctions with Application to Reach-Through Breakdown Voltage of Semiconductor Devices with Diffused Base | IEEE Conference Publication | IEEE Xplore

Calculation of the Depletion Region Width and Barrier Capacitance of Diffused Semiconductor Junctions with Application to Reach-Through Breakdown Voltage of Semiconductor Devices with Diffused Base


Abstract:

Based on new fundamental equations, the calculation of the depletion region width and barrier capacitance of practical diffused semiconductor junctions was achieved for t...Show More

Abstract:

Based on new fundamental equations, the calculation of the depletion region width and barrier capacitance of practical diffused semiconductor junctions was achieved for the first time in this work. The obtained formulas are valid for p-n junctions, Schottky junctions, hetero-junctions and other types of semiconductor junctions. As application, an analytical formula for the reach-through breakdown voltage of PT- (punch-through) IGBTs, asymmetric thyristors and bipolar transistors with diffused base is presented for the first time.
Date of Conference: 15 October 2007 - 17 September 2007
Date Added to IEEE Xplore: 14 May 2008
Print ISBN:978-1-4244-0847-4

ISSN Information:

Conference Location: Sinaia, Romania

Contact IEEE to Subscribe

References

References is not available for this document.