Controlled stepwise motion in polysilicon microstructures

This paper presents a polysilicon slider and a rotor capable of stepwise motion. These devices were fabricated on a silicon wafer with surface micromachine technology. The proportional relation between the velocity of motion and the frequency of the applied pulse was experimentally confirmed. The peak value of the applied pulse determines the step length. The step values observed were in the range of 10-30 nm for a bushing height of 1.0 mu m and of 40-80 nm for a bushing height of 2.0 mu m depending on the peak voltage of the applied pulse.<>