Abstract:
Electron beam lithography is a rapidly maturing technology that has opened the realm of submicron design to the semiconductor device and circuit designer. This improved p...Show MoreMetadata
Abstract:
Electron beam lithography is a rapidly maturing technology that has opened the realm of submicron design to the semiconductor device and circuit designer. This improved pattern resolution has already yielded devices and circuits exhibiting higher density, higher operating frequency, and lower operating power than has been possible with other lithography methods. This paper discusses electron beam lithography and the devices and circuits that have been fabricated with this technology.
Published in: 16th Design Automation Conference
Date of Conference: 25-27 June 1979
Date Added to IEEE Xplore: 06 March 2006
