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Emitter—Base—Collector self-aligned heterojunction bipolar transistors using wet etching process | IEEE Journals & Magazine | IEEE Xplore

Emitter—Base—Collector self-aligned heterojunction bipolar transistors using wet etching process


Abstract:

The first emitter-base-collector (EBC) self-aligned (SA) heterojunction bipolar transistors (HBT's) using wet etching process are described. This self-alignment fabricati...Show More

Abstract:

The first emitter-base-collector (EBC) self-aligned (SA) heterojunction bipolar transistors (HBT's) using wet etching process are described. This self-alignment fabrication technique is extremely simple but can get excellent high-frequency performance. An HBT with a 4-µm-wide emitter mesa showed 18 GHz of Ftand 13 GHz ofF_{\max}. By optimizing this process, high-frequency operation above 40 GHz can be expected.
Published in: IEEE Electron Device Letters ( Volume: 7, Issue: 12, December 1986)
Page(s): 694 - 696
Date of Publication: 31 December 1986

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