Abstract:
Schottky-type p-GaN gate gallium nitride high electron mobility transistors suffer from threshold voltage (V_\mathsf {th}) instability phenomenon. Both positive and neg...Show MoreMetadata
Abstract:
Schottky-type p-GaN gate gallium nitride high electron mobility transistors suffer from threshold voltage (V_\mathsf {th}) instability phenomenon. Both positive and negative V_\mathsf {th} shifts are reported when device undertakes the voltage bias, but the impact of this V_\mathsf {th} instability phenomenon on device switching behaviors is less investigated. In this study, the drain-source voltage (V_\mathsf {ds}) induced bidirectional V_\mathsf {th} shift in hard-switching condition is characterized and decoupled by an H-bridge based double-pulse test. Subsequently, the influence of V_\mathsf {th} shift on switching behaviors is theoretically analyzed and demonstrated through SPICE simulation and experiment, showing how a positive shifted V_\mathsf {th} can reduce the device turn-on commutation speed and increase the switching losses, and vice versa. The results suggest that the V_\mathsf {th} instability phenomenon should be considered in accurate switching modeling.
Published in: IEEE Transactions on Power Electronics ( Volume: 39, Issue: 9, September 2024)