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Physics and Technologies for Operating Cat‐CVD Apparatus | part of Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD | Wiley Semiconductors books | IEEE Xplore

Physics and Technologies for Operating Cat‐CVD Apparatus

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Chapter Abstract:

Summary This chapter summarizes realistic topics that are important for industrial implementation of catalytic chemical vapor deposition (Cat‐CVD) technology. It discusse...Show More

Chapter Abstract:

Summary

This chapter summarizes realistic topics that are important for industrial implementation of catalytic chemical vapor deposition (Cat‐CVD) technology. It discusses the influence of thermal radiation from heated catalyzers and the contamination from heated metals along with methods to overcome the problems associated with these aspects. The points relevant to building mass production machines are introduced. The chapter may be useful for people who venture to construct a Cat‐CVD apparatus and for people who like to know the practical issues of Cat‐CVD technology for actual application. One of the most important issues in CVD systems is cleaning of the chamber wall. The chapter also briefly introduces the status of the development of mass production Cat‐CVD machines. Cat‐CVD is also applied to prepare gas barrier films. The possibility to form coatings on various materials is one of the useful advantages of Cat‐CVD, and the apparatuses for realizing it have been supplied by industrial companies.

Page(s): 249 - 291
Copyright Year: 2019
Edition: 1
ISBN Information:

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