Non‐Thermal Initiation Strategies and Grafting

Summary

This chapter focuses on chemical vapor deposition (CVD) that is initiated via thermal processes, either via direct activation of a target monomer or by activation of an initiator. It explains initiation strategies such as plasma initiation strategies, and photoinitiation strategies. Plasmas can be generated in a variety of ways, but generally involve subjecting a monomer in the gas phase to an energetic discharge through application of electrical energy. The use of UV photoinitiators often can lead to direct grafting of the polymer to the desired substrate due to the mechanism of activation. One of the most common ways to increase adhesion between a CVD thin film and its substrate is through the use of grafting, that is, covalently bonding the desired polymer film to its substrate.