Abstract:
This work investigates the effect of hole injection/light emission to suppress buffer-related dynamic {R}_{\text {ON}} degradation in an E-mode GaN-on-Si active-passi...Show MoreMetadata
Abstract:
This work investigates the effect of hole injection/light emission to suppress buffer-related dynamic {R}_{\text {ON}} degradation in an E-mode GaN-on-Si active-passivation p-GaN gate high electron mobility transistor (AP-HEMT). The AP-HEMT features a thin p-GaN layer (i.e., the active passivation) covering the drain-side access region. The conventional p-GaN gate HEMT (Conv-HEMT) has been reported to mitigate the buffer trapping by hole injection/light emission from gate that pumps out the trapped electrons in buffer. In the AP-HEMT, hole injection and light emission occurs at the active passivation region as well. To evaluate the effectiveness of the hole/light pumping effect in AP-HEMT, back-gating measurements were performed to assess the recovery of buffer-related dynamic {R}_{\text {ON}} . In the positive substrate voltage ( {V}_{\text {SUB}}{)} sweep test, the {I}_{\text {D}} of Conv-HEMTs drops significantly during the back-sweep due to the negative charges trapped in the buffer. However, the AP-HEMT shows no reduction in {I}_{\text {D}} during VSUB back-sweeps. In the recovery test after a {V}_{\text {SUB stress}} , the AP-HEMT experiences much smaller initial {I}_{\text {D}} degradation and recovers much faster than the Conv-HEMT. These results confirm that the hole/light pumping effect in the AP-HEMT effectively suppresses buffer-related dynamic {R}_{\text {ON}} degradation.
Published in: IEEE Transactions on Electron Devices ( Volume: 71, Issue: 1, January 2024)