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High Restore Yield NVSRAM Structures With Dual Complementary RRAM Devices for High-Speed Applications | IEEE Journals & Magazine | IEEE Xplore

High Restore Yield NVSRAM Structures With Dual Complementary RRAM Devices for High-Speed Applications


Abstract:

Static random access memory (SRAM) plays a key role in the overall performance of electronic systems because of its rapid data processing and transmission speed; however,...Show More

Abstract:

Static random access memory (SRAM) plays a key role in the overall performance of electronic systems because of its rapid data processing and transmission speed; however, when the system power supply is cut off, the data stored in the nodes are lost. Thus, this article proposes four nonvolatile SRAM (NVSRAM) cells that use unilateral or bilateral structures with dual complementary series resistive random access memory (RRAM) devices. It is found that the read, write, and hold static noise margins (HSNMs) are comparable with those of the standard 6T-SRAM. Moreover, the store and restore operations operate in parallel at high speed. The store operation delay is only 6 ns for unilateral structures and 5 ns for bilateral structures, and the restore delay is only 10 ns for unilateral structures and 6 ns for bilateral structures. The maximum power consumption among the four structures for storing and restoring a “1” are 1.545 pJ/bit and 134.5 fJ/bit, respectively. Furthermore, the dual complementary series resistor structures can achieve a high restore yield at a resistance ratio of 1.5. Therefore, a high restore yield can be achieved even with large resistance fluctuations caused by the voltage, time, and process.
Page(s): 522 - 531
Date of Publication: 13 February 2023

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