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A Global Model of the Collisional Plasma Boundary Sheath Using Step Model | IEEE Journals & Magazine | IEEE Xplore

A Global Model of the Collisional Plasma Boundary Sheath Using Step Model


Abstract:

Capacitively coupled plasmas (CCPs) are widely used for material processing, for example, for the manufacturing of semiconductors textile and modified surface. The ever-i...Show More

Abstract:

Capacitively coupled plasmas (CCPs) are widely used for material processing, for example, for the manufacturing of semiconductors textile and modified surface. The ever-increasing requirements that companies face with respect to the quality, efficiency, and environmental friendliness of their manufacturing processes demand continuous progress. One simple and significant path to gain insight is the global model. Global models, which are, in engineering, called the lumped element model, allow for a complete and transparent mathematical analysis. Therefore, this work will study three models, the example of the exact model, and its verification using the step model to find the analytical relation between the sheath charge and the overall voltage drop across it. This formula is the missing factor in the global model that establishes the aim of the research. In addition, an effective lumped element model was studied, which allows describing the sheath dynamics in simple, though nonlinear engineering terms, such as resistance, capacitance, and inductance. The study achieves more detailed dynamics, such as the time-varying charge, voltage distribution, charge-voltage distribution V_{\text {sh}}(Q) that controls the nonlinear sheath dynamics, current distributions, and the equation of the sheath distance for dc and ac sheaths. The results obtained at low computational complexity provide satisfactory calculations for nonlinear dynamics of collision sheath behavior.
Published in: IEEE Transactions on Plasma Science ( Volume: 49, Issue: 2, February 2021)
Page(s): 711 - 717
Date of Publication: 20 January 2021

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