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Mathematical Simulation of Processes in ICP/RF Plasma Torch for Plasma Chemical Reactions | IEEE Journals & Magazine | IEEE Xplore

Mathematical Simulation of Processes in ICP/RF Plasma Torch for Plasma Chemical Reactions


Abstract:

This paper presents the results of mathematical simulation of processes in argon-hydrogen inductively coupled plasma/radio frequency induction plasma torch for plasma che...Show More

Abstract:

This paper presents the results of mathematical simulation of processes in argon-hydrogen inductively coupled plasma/radio frequency induction plasma torch for plasma chemical reactions. This first part starts a series of papers for simulation and study of plasma properties for a variety of gases and mixtures, which could be used for a number of prospective technologies. The results of mathematical simulation allow further research on the mechanisms of chemical reactions in argon-hydrogen plasma to increase effectiveness of obtaining the target product.
Published in: IEEE Transactions on Plasma Science ( Volume: 45, Issue: 12, December 2017)
Page(s): 3125 - 3129
Date of Publication: 07 December 2017

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