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Weighted windowed PLS models for virtual metrology of an industrial plasma etch process | IEEE Conference Publication | IEEE Xplore

Weighted windowed PLS models for virtual metrology of an industrial plasma etch process


Abstract:

Virtual metrology is the prediction of metrology variables using easily accessible process variables and mathematical models. Because metrology variables in semiconductor...Show More

Abstract:

Virtual metrology is the prediction of metrology variables using easily accessible process variables and mathematical models. Because metrology variables in semiconductor manufacture can be expensive and time consuming to measure, virtual metrology is beneficial as it reduces cost and throughput time. This work proposes a virtual metrology scheme that uses sliding-window models to virtually measure etch rates in an industrial plasma etch process. The windowed models use partial least squares (PLS) regression and a sample weighting scheme to combat the effects of both process drifts due to machine conditioning and process shifts due to maintenance events. An industrial data set is examined and the weighted windowed PLS models outperform global models and non-weighted windowed models.
Date of Conference: 14-17 March 2010
Date Added to IEEE Xplore: 27 May 2010
ISBN Information:
Conference Location: Via del Mar, Chile

References

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