Flash memories: a review | IEEE Conference Publication | IEEE Xplore

Flash memories: a review


Abstract:

Summary form only given. Many approaches are being used to manufacture or develop flash memory products to meet various market needs. These approaches can be classified b...Show More

First Page of the Article

Abstract:

Summary form only given. Many approaches are being used to manufacture or develop flash memory products to meet various market needs. These approaches can be classified broadly according to programming mechanism: channel hot electron (including source-side injection) and Fowler-Nordheim tunnelling. Some of the technologies in manufacturing or in development are: NOR stack gate, split gate, source-side injection NAND, DINOR, AND. In addition, a host of technologies for embedded flash applications are in different stages of development. Multi-level cell technologies are being developed to reduce cost/bit. 3-D structures are being investigated to realize small cell size. This paper reviews the different memory technologies, principles of operation, the status, the tradeoffs in cost, performance and reliability. It also discusses emerging flash technologies to serve industrial and next generation consumer electronic products including low voltage, low power portable and mobile devices.
Date of Conference: 24-26 June 1996
Date Added to IEEE Xplore: 06 August 2002
Print ISBN:0-7803-3510-4
Conference Location: Albuquerque, NM, USA

First Page of the Article


Contact IEEE to Subscribe