Abstract:
A novel 16V Lateral Double-diffused MOSFET (LDMOS) based on a standard 0.18 \mu\mathrm{m} BCD platform is reported in this work, which uses grid-gate technology to real...Show MoreMetadata
Abstract:
A novel 16V Lateral Double-diffused MOSFET (LDMOS) based on a standard 0.18 \mu\mathrm{m} BCD platform is reported in this work, which uses grid-gate technology to realize the 35V off-state breakdown voltage (\text{BV}_{\mathrm{O}\mathrm{F}\mathrm{F}}) with a reduction in the specific on-resistance (\mathrm{R}_{\mathrm{o}\mathrm{n},\mathrm{s}\mathrm{p}}) from 6.8\mathrm{m}\Omega\cdot \text{mm}^{2} to 5.9\mathrm{m}\Omega\cdot \text{mm}^{2}. By utilizing the single buffer structure and buffer RESURF composite structure, the proposed grid-gate 16V-nLDMOS is optimized to meet the requirements of 28V \text{BV}_{\mathrm{O}\mathrm{F}\mathrm{F}} and the measured \mathrm{R}_{\mathrm{o}\mathrm{n},\text{sp}} is reduced to 4.7\mathrm{m}\Omega\cdot \text{mm}^{2}. What's more, TLP experiments on the samples illustrated that the proposed buffer structures can extend the safe operation area (SOA) of grid-gate LDMOS to satisfy the need for DC-DC application.
Date of Conference: 02-06 June 2024
Date Added to IEEE Xplore: 09 July 2024
ISBN Information: