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Fano Resonance from Air-mode Photonic Crystal Nanobeam Cavity with 248-nm DUV Lithography | IEEE Conference Publication | IEEE Xplore

Fano Resonance from Air-mode Photonic Crystal Nanobeam Cavity with 248-nm DUV Lithography


Abstract:

Photonic crystal nanobeam cavity (PCNC) is important building block for large-scale photonic integrated circuits (PICs). Nevertheless, most state-of-the-art demonstration...Show More

Abstract:

Photonic crystal nanobeam cavity (PCNC) is important building block for large-scale photonic integrated circuits (PICs). Nevertheless, most state-of-the-art demonstrations rely on electron beam lithography (EBL). Here, we experimentally present the characteristics of Fano resonance from air-mode PCNC using 248-nm deep ultraviolet (DUV) lithography for the first time. Experimentally high average Q factor of \sim 1.58 \times 10^{4} is achieved.
Date of Conference: 02-06 July 2023
Date Added to IEEE Xplore: 14 August 2023
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Conference Location: Shanghai, China

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