High efficient suspended coupler based on IME's MPW platform with 193nm lithography

Benefiting from the new 193nm lithography, a narrow tip with width of 100 nm can be fabricated on IME's MPW platform. Based on the new capability, we optimized the suspended coupler and realized the state-of-the-art coupling loss less than -1.3 dB/facet with cleaved single mode fiber. A uniformity of 0.4 dB across wafers has also been confirmed, the best performance to our knowledge realized in public-available silicon photonics platform.