Use of surface sensitive analysis techniques for the study of silicide processes in power transistors: platinum silicide formation as an example

This study demonstrates how to gain a fundamental understanding of semiconductor unit processes using surface sensitive analysis techniques. Silicide processes are presently widely-used in power transistor technology. Therefore, the platinum silicide formation has been examined systematically. Besides this technological aspect it is also shown that X-ray induced photoelectron spectroscopy (XPS) in combination with other surface sensitive methods are powerful tools which can be adjuvant for industrial questions as well