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Cost control, production efficiency, cycle time and yield are critical quality benchmarks for nano-electronics production. Their sensitivity to the statistical variations of the IC manufacturing process is increasing more and more in comparison to the process complexity. Therefore, the following two joint tasks become essential: To characterize statistically IC manufacturing fluctuations, and To predict reliably circuit performance spreads at the design stage.
In this tutorial we will introduce yield concept in electronic design, get acquainted with mathematical issues, review methodologies in order to face the problem, their classification and type, and introduce a new methodology to improve computation of yield optimization.