Characterization of a Xenon plasma electron flood gun on a GSD-200E/sup 2/ high current implanter using Q/sub BD/, FLASH, SPIDER, and CHARM/sup TM/-2 wafers

An enhanced xenon plasma electron flood gun (PEF-Xe) used in a GSD-200E/sup 2/ ion implanter is characterized by means of various wafer test structures. High dose/beam current implants are performed under different PEF settings to investigate the charge neutralization capability of the tool. Q/sub BD/, FLASH, SPIDER and CHARM/sup TM/-2 test structures are used to explore a range of operating conditions for high beam current arsenic implants.