Macroparticle reflection from a biased substrate in a vacuum arc deposition system

The reflection of macroparticles, generated by a vacuum arc, from a substrate biased negatively with respect to the surrounding plasma is considered. Charging of macroparticle in the near-substrate sheath and its influence on the macroparticle motion were taken into account. It was found that macroparticles can be either reflected or attracted to the substrate depending strongly on the ion current density. The possibility of macroparticle reflection increases with negative bias voltage and saturates at about a few hundred volts.