Reducing perfluorinated compound emissions [CVD chamber cleaning]

Hexafluorethane (C/sub 2/F/sub 6/) is a perfluorinated compound (PFC) used extensively throughout the semiconductor industry to clean chemical vapor deposition (CVD) chambers. Although ongoing process improvements to the C/sub 2/F/sub 6/ clean are helping to reduce PFC emissions at the IBM Microelectronics Division 200 mm fabricator in Essex Junction, Vermont, based on the current US Environmental Protection Agency (EPA) emission guidelines, further reduction is needed. Alternative chemistry evaluations indicate that the use of nitrogen trifluoride (NF/sub 3/) diluted in helium (He) has the potential to significantly reduce PFC emissions.