Back Diffusion of Electrons in Ar, $\hbox{SF}_{6}$ , and $\hbox{Ar} + \hbox{SF}_{6}$ Binary Mixtures

The back diffusion processes in Ar, SF
₆
, and Ar + SF
₆
binary mixtures are analyzed by a Monte Carlo simulation method employing realistic collision cross sections of the respective component gases in the
E
/
N
range from 50 to 500 Td. The escape factors in pure Ar are always higher than that of those in pure SF
₆
, and as the SF
₆
content in the binary mixture increases, the escape factors decrease accordingly. Furthermore, the number of collisions observed for the backscattered electrons before returning to cathode in SF
₆
are smaller than that of those in Ar, and as the SF
₆
content in the binary mixture increases, the mean number of collisions of the backscattered electrons decrease accordingly.