Elemental Composition Analysis of DC Magnetron Sputter Deposited Various Cu Thin Films

In this study, various copper thin films are deposited using in-house DC magnetron sputtering system at different deposition conditions. The elemental composition of the deposited thin films is investigated by using X-ray Photoelectron Spectroscopy (XPS). The total survey scan and the high-resolution scan at Cu 2p positions are studied thoroughly to optimize the deposition parameter for obtaining better copper content. It is observed that prominent peaks of Cu 2p3/2 and Cu 2p1/2 are obtained from the high-resolution scan of Cu 2p in this developed thin film and these peaks are separated around ~ 19 e V which implies the formation of various oxides.