Improving Ruthenium Polishing Through the use of Ceria Abrasives

Ceria abrasive particles can polish oxides through both mechanical and chemical means. Standard metal polishing occurs through the addition of oxidizing agents to form weaker oxide films that are easier to remove mechanically by silica particles. By replacing this silica with ceria, ruthenium removal rate and roughness can be improved while lowering both the oxidizing agent and abrasive concentration.