Epitaxial growth of 1 /spl mu/m thick nonlinear optical KNbO/sub 3/ thin films by pulsed laser deposition with in situ laser annealing

We fabricated a KNbO/sub 3/ [110] thin film on MgO [100] using pulsed laser deposition with in situ laser annealing. We used a KrF laser beam (248 nm, 20 Hz, 10 ns) that is divided into two beams: an ablation beam and an in situ laser annealing beam onto the film surface.