Dynamic Matching System for Radio-Frequency Plasma Generation

Plasma generation systems represent a particularly challenging load for radio-frequency power amplifiers owing to the combination of high operating frequency (e.g., 13.56 MHz) and highly variable load parameters. We introduce a dynamic matching system for inductively coupled plasma (ICP) generation that losslessly maintains near-constant driving point impedance (for low reflected power) across the entire plasma operating range. This new system utilizes a resistance compression network (RCN), an impedance transformation stage, and a specially configured set of plasma drive coils to achieve rapid adjustment to plasma load variations. As compared to conventional matching techniques for plasma systems, the proposed approach has the benefit of relatively low cost and fast response, and does not require any moving components. We describe suitable coil geometries for the proposed system, and treat the design of the RCN and matching stages, including design options and tradeoffs. A prototype system is implemented and its operation is demonstrated with low pressure ICP discharges with O
₂
, C
₄
F
₈
, and SF
₆
gases at 13.56 MHz and over the entire plasma operating range of up to 250 W.