Structural-phase state and electrophysical properties of Ru thin films

The paper shows the results of the study structural-phase state and electrical properties of Ru nanocrystalline films. It was found that the film thickness and substrate temperature greatly affects on the crystal structure of these nanostructures. At thickness d <; 50 nm films were quasi amorphous structure regardless of the substrate temperature with resistivity ρ = (3-5)10
^-4
Ω·m. With increasing thickness up to d > 50 nm and heating the substrate upon receipt of 600 K and subsequent annealing to 900 K formed polycrystalline hexagonal structure with an average crystallite size of 15 nm. Lattice parameters close to the table values for bulk samples and ρ = (2-4)·10
^-6
Ω·m.