New bifocal pinch experiment speed 3

Intense sources in the spectral range of VUV- to SXR-radiation (λ= 200 … 0.05 nm) are used for e.g. micro lithography or X-ray microscopy. These applications require intense short radiation pulses emitted in small spectral channels from a spot-like source. For technical applications a compact and transportable design in combination with easy maintenance is also desired.