Structural and electrical studies of RF magnetron sputtered ZnO films under different RF powered conditions

We report the structural and electrical studies of ZnO thin films under different RF power (50 to 300 Watt in steps of 50 watt). The ZnO thin films were deposited on glass substrate by radio frequency (RF) magnetron sputtering method in an argon atmosphere. The surface morphology, crystallinity and conductivity were analyzed by FESEM, AFM, XRD and current voltage (I-V) probe measurement system. The results showed the highest conductivity value at 300 Watt RF power (12.479 Sm
⁻¹
). The higher conductivity material is preferred due to their low driving power when used as a gas sensor.