Influence of nitrogen pressure on silicon content in Ti-Si-N coatings deposited by the vacuum-arc method

Influence of nitrogen pressure on silicon content in Ti-Si-N coatings deposited by the vacuum-arc method using Ti
_0,96
-Si
_0,04
alloy as a consumable cathode material was was investigated. It is found out, that the silicon content in coatings regardless of deposition conditions is lower than in the cathode. In pressure range from 5·10
^-4
to 10
^-3
Torr, film has minimal silicon content (~ 0.4 wt. %) and maximal hardness (35 GPa). It is supposed, that the extremum character of coating silicon concentration and hardness dependencies on nitrogen pressure is a result of distinction of structure-phase composition of the coatings obtained at different pressure.