Fabrication of Titanium-Doped Indium Oxide Films for Dye-Sensitized Solar Cell Application Using Reactive RF Magnetron Sputter Method

To develop high-efficiency transparent conductive oxide glass in a longer wavelength zone for dye-sensitized solar cell (DSC) application, we fabricate titanium-doped indium oxide (ITiO) films on a soda-lime glass substrate by an RF magnetron sputtering. The ITiO films showed a minimum resistivity of 1.25 times 10
^-3
Omega ldr cm. The transmittance increases from 80% at 450 nm to 90% at 700 nm in the visible spectrum. From the atomic force microscopy result, the surface roughness of the sample showed a change from 10 to 50 nm with annealing temperature. From the XPS result, the concentration ratio (%) for In, Ti, and O was 27 : 2 : 42. The annealing treatment on the ITiO films improves the photovoltaic characteristics of the ITiO-based DSCs, and energy conversion efficiency (eta) is 5.79% (FF: 0.62, V
_oc
: 0.71 V, J
_sc
: 13.23 mA/cm
²
) at 100-mW/cm
²
light intensity.