Magnetoresistance and Magnetic Anisotropy Properties of Strain-Induced Co/Ag Multilayer Films

We report on the magnetoresistance (MR) properties of [Co(tCo)/Ag 1.5 nm]
₂₀
multilayer and alloy films grown with the pulse electrochemical deposition on a polyamide substrate (1 cm
²
). The induced uniaxial magnetic anisotropy was observed due to the effect of strain in all the multilayer films. The multilayer [Co 1.5 nm/Ag 1.5 nm]
₂₀
showed a minimum hysteresis loss. The maximum MR ratio for Co/Ag was 9.2% at 1 kOe. A remarkable difference of magnetic field dependence of the magnetoresistance ratio was observed, corresponding to the orientation of magnetization curves.