Passivation for three-dimensional actuation microstructures using ECR-CVD

Xaar actuators have been fabricated using PZT as a substrate with aspect ratios of the order of 6:1. The fabrication of a passivation layer of suitable quality, to ensure adequate device lifetime, requires a significant improvement over standard PECVD depositions of inorganic coatings. In this paper Electron Cyclotron Resonance Chemical Vapour Deposition (ECR-CVD) has been used for the deposition of silicon nitride barrier films on PZT.