Preparation and Characteristics of Co-Cr Films by EP Magnetron Co-sputtering Technique

Experimental results are given on high-rate low-temperature deposition of Co-Cr films using an exposed pole (EP) magnetron simultaneous sputtering system developed by the authors for deposition of ferromagnetic binary alloy films. A composite target is prepared consisting of a Co washer, a Cr cylinder, and a Co disk; the performance of the sputtering system is examined and the film quality evaluated. The results are as follows: 1) the maximum deposition rate was as high as 0.18 μm/min for 7.6 W/cm
²
of input power; 2) the deposition rate was higher for lower sputtering gas pressures; 3) the substrate temperature was as low as 100°C for 7.6 W/cm
²
input power; 4) the C-axis of the deposited Co-Cr films was oriented perpendicular to the film plane, with Δθ
₅₀
= 8 to 13°; and 5) perpendicular magnetic anisotropy films were obtained when the film M
_s
= 300 to 800 emu/cc and H
_c
= 250 to 350 Oe. Thus it is concluded that EP magnetron simultaneous sputtering is very useful for the deposition of Co-Cr films.