Fabrication Study of Solid Microneedles Array Using HNA

This paper presents an approach for the process development of the out of plane silicon microneedles array fabrication. This study utilizes the wet etching technology using HNA to build a structure of sharp-tipped microneedles; biconvex-conical shaped. The height of the fabricated microneedle is 41.8μm and the tip radii is 1.4 μm. Investigation on the effect of varying the mask opening window had been carried out. The design approach and the fabrication process are well explained here.