New alternative graphing methods for thin-film interferometry data

Thin-film interferometry has long been used to monitor deposition and etching processes. The authors present Lissajous and phase-space graphs of thin-film interferometry traces and discuss some of the practical implications of graphing the data in these nontraditional formats. These types of graphs can highlight certain process events and provide a more user-friendly operator interface for the control of thin-film etching and deposition processes.<
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