Novel photo resist stripping for single wafer environmentally friendly process

We have developed the resist stripping method having an extremely high stripping performance by single wafer process (SHARK Cleaning). In this study, we tried the improvement of the running cost that was the disadvantage of the SHARK cleaning. As a result, we drastically improved the chemical consumption maintaining the resist stripping performance by heating H/sub 2/SO/sub 4/ and optimizing the mixture ratio of the chemicals. Therefore, a cost reduction and environmentally friendly process with a high stripping performance were possible.