High-reliability and high-speed design of 1Mb CMOS SRAM with 0.5/spl mu/m devices

A 13- 1Mb CMOS SRAM fabricated with triple polysilicon, double metal layers and 0.5~ gate MOS FET's will be described. The RAM utilizes the divided double-word-line scheme and three stage sense ampli6ers for high-speed operation. MMWV~L performance of the RAM is enhanced by 0.5μm MOS devices fully used in the internal circuits. An on-chip voltage down converter ( VDC ) is well designed to supply the internal VCC of 3.3V and to maintain the reliability of 0.5μm devices at external 5V operation.