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Efficient parameter extraction techniques for a new surface-potential-based MOS model for RF applications | IEEE Conference Publication | IEEE Xplore

Efficient parameter extraction techniques for a new surface-potential-based MOS model for RF applications


Abstract:

Efficient parameter extraction techniques for a new surface-potential-based MOS model are outlined. The new model is suitable for RF CMOS design because it has improved m...Show More

Abstract:

Efficient parameter extraction techniques for a new surface-potential-based MOS model are outlined. The new model is suitable for RF CMOS design because it has improved modelling of surface potential, mobility and conductance. The extraction techniques are based on analytical manipulation of the model equations and allow parameters to be extracted using as few as 12 measurements per device.
Date of Conference: 19-22 March 2001
Date Added to IEEE Xplore: 07 August 2002
Print ISBN:0-7803-6511-9
Conference Location: Kobe, Japan

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